Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution

Document Type : Original Article

Authors

1 Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.

2 I.Javakhishvili Tbilisi State University, 3 Ilia Chavchavadze Avenue, 0128, Tbilisi, Georgia.

3 Georgian Technical University, 77Merab Kostava Avenue, 0175 Tbilisi, Georgia.

10.18576/jpac/030302

Abstract

The nucleation process of silicon dioxide nanoparticles in tetraethoxysilane solutions is studied. For the investigation, infrared spectrometry, optical and transmission electron microscopy was used. Size distribution of nanoparticles was determined and corresponding histograms were plotted.

Keywords

Journal of Pharmaceutical and Applied Chemistry
Volume 3, Issue 2
September 2017
Pages 14-16

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